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Abbreviation (ISO4): Prog Chem      Editor in chief: Jincai ZHAO

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Review

Selective Ionic Removal Strategy and Adsorbent Preparation

  • Zhixuan Wang ,
  • Shaokui Zheng , *
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  • School of Environment, Beijing Normal University,Beijing 100875, China
* Corresponding author e-mail:

Received date: 2022-10-14

  Revised date: 2023-03-20

  Online published: 2023-04-30

Supported by

National Natural Science Foundation of China(22176015)

Abstract

The selective ionic removal from water or wastewater by newly-developed adsorbents has been intensely investigated around the world since 1960s. These selective ionic adsorbents were used to control the concentrations of specific ions in drinking water or wastewater in the presence of plentiful coexisting ions to prepare quality drinking water or avoid ecological hazards in natural waterbodies due to wastewater discharge. Due to remarkable market demands and wide application prospects, this topic still generates numerous amazing findings in terms of international publications in recent decade. Besides the history, the present status and the research bias, this paper lays particular emphasis on the four selective ionic removal strategies involved in previous studies (i.e., the molecular imprinting technology, the soft and hard acid base theory, the non-electrostatic interaction theory, and the self-inhibition theory of competitive ions), including their mechanisms, histories, and adsorbent preparations and applications. Finally, this review also prospects the future research directions. This review provides overall information for the further development of selective ionic adsorbents for water or wastewater treatment.

Contents

1 Introduction

2 Selective ion adsorption materials based on molecular imprinting technology

2.1 Principles and development history of molecular imprinting technology

2.2 Preparation of molecularly imprinted materials and selective ion adsorption

3 Selective ion adsorption materials based on hard and soft acid base theory

3.1 The development history of acid-base theory

3.2 Preparation of hard and soft acid base materials and selective ion adsorption

4 Selective anion adsorption materials based on non-electrostatic interaction

4.1 Selective ion adsorption based on hydrophilicity and hydrophobicity

4.2 Selective ion adsorption based on hydrogen bonding

5 Selective ion adsorption of standard resin based on competitive ion self-inhibition mechanism

6 Conclusion and outlook

Cite this article

Zhixuan Wang , Shaokui Zheng . Selective Ionic Removal Strategy and Adsorbent Preparation[J]. Progress in Chemistry, 2023 , 35(5) : 780 -793 . DOI: 10.7536/PC221005

1 Introduction

Natural water bodies (including surface water bodies such as rivers, lakes, seas and groundwater) usually contain abundant types of inorganic anions and cations, which provide sufficient nutrients for aquatic animals, plants and microorganisms. When the concentration of some ions is too high, it will cause serious ecological risks and ultimately endanger human survival.China's Environmental Quality Standards for Surface Water stipulates Cu2+, Hg2+, Cd2+, Pb2+,The safe concentrations of 18 inorganic cations such as Co2+ and 6 inorganic anions such as F-, Cl-, SO 4 2 -, and NO 3 -,To meet the different functional requirements of surface water[1]. The Sanitary Standard for Drinking Water in China sets the safe concentrations of 16 inorganic cations such as Cu2+ and 8 inorganic anions such as F- to ensure the safety of drinking water[2]. In order to limit the impact of specific inorganic ions discharged with sewage on the quality of natural water environment, China's Integrated Wastewater Discharge Standard sets the safe concentrations of 10 inorganic cations such as Cu2+ and phosphate anions[3]. It can be seen that there are diversified requirements for specific ion concentration control in the field of environment and sanitation, and the research and development of specific ion concentration control technology is conducive to ensuring the safety of drinking water, controlling the ecological risk of discharged sewage, and ensuring the environmental quality of surface water, which has a very wide market demand and application prospects.
As a classical ion adsorption material, standard ion exchange resin (hereinafter referred to as standard resin) can be divided into gel type (chemical pore, that is, the gap between molecules or chains) and macroporous type (physical pore) resin according to the type of skeleton material, and can be divided into styrene, acrylic, phenolic, epoxy and vinyl pyridine resin according to the type of polymer monomer.According to the type of functional group, it can be divided into strong acid cation (-SO3H), weak acid cation (-COOH or -CHPO(OH)2),Strongly basic anion (-CH2N(CH3)3OH or -CH2N(CH3)2(C2H4OH)OH) and weakly basic anion (-CH2NH2, -CH2NHR, or -CH2NR2) resins[4,5]. The research and industrial application of standard resins began in the 1930s. In 1935, British chemists Adams and Holmes first prepared ion exchange resin from phenol and formaldehyde. Two years later, German IG Company realized the industrial production of phenol-formaldehyde resin and applied it to hard water softening and pure water preparation[6][7]. In 1945, GE Company of the United States synthesized a better quality styrene and acrylic gel resin[7]. After the end of World War II, the United States, Britain and Germany successively realized the industrial production of styrenic strong base anionic resin and strong acid cationic resin, and since then the industrial application of standard resin has entered the fast lane[6]. In 1962, RH Company of the United States developed macroporous ion exchange resin as a catalyst for non-aqueous solution reaction, and most of the standard resin types were produced[7]. Because of the differences in valence and ionic radius of different inorganic ions, their exchange or adsorption on the standard resin has an obvious selective order, for example, the exchange order of inorganic cations on the standard strong acid cation resin is Th4+>Fe3+>Al3+>Ba2+>Pb2+>Sr2+>Cd2+>Co2+>Ni2+>Cu2+>Zn2+>Mg2+> UO 2 2 + >Ag+>Cs+>Ca2+>K+>Na+>H+>Li+.The exchange order of inorganic anions on standard strong base anion resin is SO 4 2 - > CrO 4 2 -.> NO 3 - > AsO 4 3 - > PO 4 3 - > MoO 4 2 - >CH3COO->I->Br->Cl->F-[5]。 In this case, when the target ion is an inorganic ion late in the exchange sequence, the ion exchange reaction of the standard resin will involve the target ion and a coexisting ion early in the exchange sequence (i.e., resulting in overtreatment),This not only increases the consumption of regeneration liquid and the treatment cost, but also increases the corrosiveness of the produced water and affects human health due to the accumulation of high concentration of chloride ions in the produced water when the counter ion is chloride ions[8].
The study of selective ion adsorption materials began in the 1960s. In 1962, Degeiso et al. Used salicylic acid-formaldehyde polymer to realize the selective adsorption of UO 2 2 + and Fe3+[9]. Since then, a large number of selective ion adsorption materials have been developed to meet a variety of inorganic ion selective adsorption needs.Such as (first reported time in parentheses) borate (1964), phosphate (1966), Cu2+(1967), NH 4 + (1970), Cd2+(1972), Cs2+(1972), CN-(1975),Ni2+(1975) 、Pb2+(1978) 、F-(1979) 、As(Ⅲ)(1981)、 NO 3 - (1981)、Sr2+(1982 )、UAg+(1982 、UNHg2+(1984 UNKPt2+(1986Cr(Ⅵ)(1988)、Pd2+(1990 )、UMg2+(1990 、Ce(Ⅳ)(1992)、As(Ⅴ)(1992)、UN TcO 4 - 998)、UNKZn2+(2000 ClO 4 - (2000)、UAl3+(2002 、UN MoO 4 2 - 007)、 BrO 3 - (2010)、U SiO 3 2 - 2010)、UNRu2+(2019[10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38]。 The skeleton materials adopted by the selective ion adsorption material comprise organic materials such as ion exchange resin, chelating resin, organic silicon, cellulose, polyurethane foam, imprinted polymer, chitosan, covalent organic materials and the like,It also includes activated alumina, clinoptilolite, titanium selenite, cerium selenite, bismuth tungstate, zirconium dioxide, silicon dioxide, graphene, activated carbon and other inorganic materials[15,27,33,34][20,22,28,30][23][35][29][36,38][39~41][42~44][11,19][13][14][24][18][26][32][45~47][48~50]. Due to the similar physical and chemical properties of some inorganic ions, sometimes the same selective ion adsorption material can selectively adsorb different target ions, for example, the anion resin containing triethylamine and trihexylamine bifunctional groups selectively adsorbs ClO 4 -或$\mathrm{TcO}_{4}^{-}$[31,33]; Activated alumina or activated alumina-based functional materials selectively adsorb phosphate ions, As (Ⅴ) or F-, etc[11][51][19].
We searched the ISI Web of Science database with the keyword "selective ion removal water" and found 2853 relevant papers published from 2018 to 2022, with the annual number of papers being 470, 604, 647, 714 and 418 (as of August 2022). The researchers are widely distributed in 97 countries/regions, among which Chinese scholars have made outstanding contributions (Figure 1).Relevant Research results have been published in 422 influential international journals such as Nature Communications, PNAS, Advanced Materials, Journal of The American Chemical Society, Environmental Science & Technology and Water Research.18 inorganic cations and 8 inorganic anions are involved,Including heavy metal ions such as Cu2+, Pb2+, Hg2+, CrO 4 2 -,18 metallic elements including noble metal ions such as Ag+ and rare earth ions such as Ce2+,Ion types that have been studied more intensively include Cu2+, Pb2+,Hg2+, CrO 4 2 -, Cs2+, Cd2+, etc. (Fig. 2)[42,52,53][54][55][56~60][44,61,62][8,63,64]. Among them, nearly 2/3 of the studies used inorganic framework materials, and the most studied framework materials were graphene (273 papers) and metal-organic framework materials (241 papers). In contrast, there was no obvious tendency to select inorganic (including inorganic ions and metal oxides) or organic active sites in these studies, and more researchers used nanoparticles (724 articles) to obtain higher adsorption capacity when metal oxide active sites were used in these studies.
图1 2018—2022年(8月)选择性离子吸附材料领域国际论文发表情况

Fig. 1 Number of international publications on selective ionic materials during 2018—2022 (August)

图2 2018—2022年(8月)选择性离子吸附材料领域国际论文中的目标离子类型

Fig. 2 Target ionic types investigated in international papers on selective ionic materials during 2018—2022 (August)

The above survey results show that even after 60 years of rapid development, the research and development field of selective ion adsorption materials still maintains a very high level of research. In this paper, four kinds of selective ion adsorption principles involved in previous studies are summarized, including molecular imprinting technology principle, soft and hard acid and base theory, non-electrostatic interaction principle and competitive ion self-inhibition principle.The adsorption mechanism, research history, material preparation and application are summarized, which is of great significance for further promoting the research and development of selective ion adsorption along the right path and controlling the concentration of specific ions in water.

2 Selective ion adsorption materials based on molecular imprinting technique

2.1 Principle and Development History of Molecular Imprinting Technology

Molecular imprinting technology is a technology that produces template Molecular cavities with specific molecular selectivity and high affinity in polymers, which is similar to the principle of enzyme and substrate recognition system in biology (the latter is often called "lock and key" model)[65]. Different molecules have different shapes, sizes and reaction characteristics, so they can be regarded as different templates, which are combined with functional monomers in a covalent, semi-covalent or non-covalent manner to form combinatorial units, and then polymerized or condensed with crosslinking agents to synthesize polymers with template-selective recognition sites.Removal of part or all of the template after polymer formation can be used for corresponding molecular recognition and adsorption (Figure 3), that is, the imprinted polymer has a unique template "memory" ability to quickly and accurately select the template (target molecule) from the mixture[66]. Broadly speaking, atoms, ions, molecules, complexes and even microorganisms can be used as templates for the preparation of imprinted materials[67]. Molecularly imprinted materials have three unique characteristics of structure predictability, recognition specificity and application universality, and are widely used in purification and separation, chemical/biological sensing, artificial antibodies, drugs and other industries due to their high stability, simple preparation methods, low cost and other advantages[65]. The traditional preparation methods of imprinted polymers are divided into chain polymerization and sol-gel method, and the chain polymerization can be further divided into bulk polymerization, suspension polymerization, emulsion polymerization and precipitation polymerization[67]. These traditional preparation methods have some problems, such as template leakage, low binding capacity, irregular shape of materials, incompatibility in aqueous medium, etc. In recent years, new molecular imprinting technologies, such as surface imprinting technology, multi-template imprinting technology and magnetic response technology, have been developed to broaden the application scope of molecularly imprinted polymers[65][68][69][70].
图3 印迹聚合物的原理[66]

Fig. 3 Principles of imprinted polymers[66]

The earliest molecular imprinting phenomenon can be traced back to 1931. Polyakov et al. Added benzene and toluene additives in the preparation process of silica particles. After washing to remove the additives, they found that the adsorption capacity of the prepared silica particles for these additives was higher than that of other structural ligands (that is, the adsorbent was selective for benzene and toluene).Later, it was found that with the addition and removal of benzene and toluene, the structure of the prepared silica particles changed significantly (that is, the molecular cavity left by the washing of benzene and toluene in the template effect)[71][67]. In 1972, Wulff and Klotz used molecular imprinting technology to prepare an organic polymer for selective adsorption, which made the study of molecular imprinting technology no longer limited to silica materials[72]. Subsequently, researchers have developed non-covalent, semi-covalent and other preparation methods of molecularly imprinted polymers, which has promoted the rapid development of molecular imprinting technology. In 1976, Nishide et al. Prepared an ion-imprinted polymer adsorbent using ions as templates[66]. Since then, molecular imprinting technology has become one of the mainstream technologies to realize the research and development of selective ion adsorption materials, and selective adsorption materials for metal ions such as Cu2+, Hg2+ and Pb2+ have been prepared in many fields such as environment, chemistry, materials and biology, thus realizing the selective removal or recovery of specific ions[73~75][76~78][79~81][65]. Aiming at the defects that the stability of the complex formed by common functional monomers (such as acrylamide, methacrylic acid and the like) and target ions is poor, so that the selectivity of the imprinted polymer of a target metal ion template is poor,Researchers used both metal ions and specific ligands that can form stable complexes as templates to synthesize double-imprinted polymers (double-imprinting technology), which improved the selectivity of molecularly imprinted materials for metal ions[82][83].

2.2 Preparation of Molecularly Imprinted Materials and Selective Ion Adsorption

According to the investigation, the prepared molecularly imprinted materials have been used for the selective adsorption of Cu2+, Hg2+, Pb2+, Cr (Ⅵ), and CN-. The following are some cases[73][76][79][84][85].
Huang et al. Synthesized a graphene oxide-based ion imprinted polymer using Pb2+ as a template and acrylamide as a functional monomer.Under the coexistence of Ca2+, Cd2+, Co2+, Ni2+ and Zn2+,Realizes the selective adsorption of Pb2+,The adsorption mechanism was then analyzed by X-ray photo electron spectroscopy (XPS) (Fig. 4), and the spectra of the adsorbent before and after adsorption showed that the eluent could completely elute the lead ions adsorbed in the imprinted cavity without destroying the chemical properties of the recognition site[86]. The Pb 4F spectrum, N 1s spectrum and O 1s spectrum after adsorption showed that the binding energy of Pb 4f5/2 and Pb 4f7/2, the binding energy of neutral amine (NH) and protonated amine (NH+) of N 1s changed, indicating that the N in two chemical States participated in the coordination reaction with Pb2+. The binding energy of carboxyl oxygen and carbonyl oxygen did not change, indicating that there was no interaction between oxygen atom and lead ion. The above results indicate that ion-imprinted adsorbents are more compatible with Pb2+ in terms of coordination geometry, size, coordination number and ionic charge, and show higher affinity for template ions. Li et al. Prepared a new type of Pb2+ imprinted polymer adsorbent with Pb2+ as template and ethylenediamine as monomer.It is found that in K+, Na+, Mg2+,Ca2+ 、Cd2+ 、Cr3+ 、Co2+ 、Fe3+ 、Mn2+ 、Under the condition of Ni2+, U Zn2+ and UN Hg2+,The adsorption capacity of the adsorbent for Pb2+ is much higher than that of other ions[79]. Liu et al. Prepared a novel Pb2+ imprinted polymer (Pb2+-IIP) using Pb2+ as template and chitosan as monomer.In Mn2+, Cr2+, Fe2+, Cu2+,Under the coexistence of Ni2+, Zn2+, Co2+ and Hg2+,The adsorption capacity of the adsorbent for Pb2+ was much higher than that for other ions[80]. Zhu et al. Prepared a new type of Pb2+ imprinted microbeads using Pb2+ as a template and 1,12-dodecanediol diphenyl-phosphonic acid and 4-vinylpyridine as monomers, and the adsorption capacity of the adsorbent for Pb2+ was much higher than that of other ions under the coexistence of competing ions Co2+ and Cd2+[81].
图4 GO-IIP的XPS图谱:(a) 吸附Pb(Ⅱ)前后的调查图谱;(b) Pb(Ⅱ)吸附后的Pb 4f光谱;吸附前(c)和吸附后(d)的N 1s谱;吸附前(e)和吸附后(f)的O1 s光谱[86]

Fig. 4 XPS spectra of GO-IIP: (a) survey spectra before and after Pb(Ⅱ) adsorption; (b) Pb 4f spectrum after Pb(Ⅱ) adsorption; N 1 s spectra before adsorption (c) and after adsorption (d); O1 s spectra before adsorption (e) and after adsorption (f)[86]

Birlik et al. Prepared a Cu2+ imprinted polymer bead using Cu2+ and succinic acid modified chitosan as templates.In the mixed solution of Cu2+, Co2+, Ni2+ and Zn2+, it was found that the adsorption capacity of the double imprinted polymer for Cu2+ was much higher than that for other ions[73]. Mishra et al. Prepared a Cu2+ imprinted polymer bead using Cu2+ and picolinic acid as templates and methyl methacrylate as monomer.Under the coexistence of Ni2+, Co2+ and Zn2+, the adsorption capacity of the adsorbent for Cu2+ is higher than that of other ions[74]. Ren et al. Prepared a Cu2+ imprinted polymer by sol-gel method using Cu2+ as template and N- [3- (2-aminoethylamino) propyl] trimethoxysilane (AAPTMS) as monomer.The adsorbent showed high selectivity for Cu2+ under the coexistence of Pb2+, Ni2+, Cd2+ and Co2+[75]. Monier et al. Prepared a Cu2+ imprinted adsorbent with Cu2+ as template and isatin modified chitosan as monomer.The adsorbent exhibit a high Cu2+ selectivity much higher than that of a non-imprinted adsorbent unde that coexistence of Pb2+, Ni2+, Cd2+ and Co2+[87].
Hajri et al. Prepared a Hg2+ imprinted adsorbent using Hg2+ as template and Schiff base modified chitosan as monomer.Under the coexistence of Zn2+, Cu2+, Pb2+, Co2+ and Cd2+,The adsorption capacity of the adsorbent for Hg2+ is much higher than that of other ions[76]. Tarisai et al. Prepared a sulfur-containing Hg2+ imprinted polymer (S-IIP) adsorbent using Hg2+ as template and thiol ligand as monomer.Under the coexistence of Zn2+, Cu2+, Pb2+, Co2+ and Cd2+,The adsorption capacity of the adsorbent for Hg2+ was higher than that of other ions[77]. Wu et al. Prepared a Hg2+ organic-inorganic hybrid imprinted adsorbent using Hg2+ and cetyltrimethylammonium bromide as templates and N- [3- (trimethoxysilyl) propyl] ethylenediamine as a monomer, which showed much higher Hg2+ selectivity than non-imprinted adsorbent under the coexistence of Cu2+ or Cd2+[78].
Gao et al. Prepared a chromate ion surface imprinting material IIP-PVI/SiO2 to selectively remove chromate from water[84]. In the presence of phosphate ions, the adsorption capacity of the adsorbent for chromate ions was much greater than that of phosphate ions compared with non-imprinted materials. Kong et al. Prepared a novel Cr (Ⅵ) -imprinted polymer (Cr (Ⅵ) -IIP) using Cr (VI) as a template, 4-vinylpyridine and N, N '-diethylaminoethyl methacrylate as monomers, and the adsorption capacity of the adsorbent for Cr (VI) was much higher than that of other ions under the coexistence of Cu2+, Cd2+ and Cr (Ⅲ)[88].
Say et al. Prepared a CN- imprinted metal chelate bead using CN- as template and Ni-methacryloylhistidine as monomer.In binary mixed solution (CN-/SCN-, CN-/S2-, CN-/Cl-,CN-/ NO 3 -, CN-/ SO 4 2 -),The adsorption capacity of the adsorbent for CN- is much higher than that of other ions[85].
In general, molecular imprinting technology has been widely used in the field of ion selective removal, especially for the removal of specific cations. The excellent selectivity makes it one of the widely used selective treatment methods. At present, the research on molecular imprinting technology mainly focuses on the preparation and application of molecularly imprinted polymers, and the research on the binding mechanism is relatively small, so the future research can be carried out in the development of new functional monomers and the reusability of molecularly imprinted materials.

3 Selective ion adsorption materials based on HSAB theory

3.1 Development history of acid-base theory

For a long time, the scope of understanding of acid-base types and acid-base reactions in academia has been expanding, which has gone through different stages, such as acid-base ionization theory, acid-base solvent theory, acid-base proton theory, acid and base electron theory and soft and hard acid-base theory, and has greatly expanded the scope of application of acid-base theory[89]. In 1887, Arrhenius, a Swedish chemist, put forward the acid-base ionization theory from the point of view of chemistry: a substance in which all the cations ionized in aqueous solution are H+ is called an acid, and a substance in which all the anions ionized in aqueous solution are OH- is called an alkali. The essence of acid-base reaction is the reaction in which H+ and OH- are combined to form water[89]. This theory describes the properties of acids and bases and their behavior in chemical reactions from a quantitative point of view, but the reactions are limited to the H+ and OH- of specific substances in water (solvent). In 1905, Franklin, an American chemist, put forward the theory of acid-base solvent, which extended the type of solvent from water to non-aqueous solvents and superacid systems: the substance that can produce the characteristic cation of the solvent is acid, and the substance that produces the characteristic anion of the solvent is alkali. The essence of acid-base reaction is that the characteristic cation and anion of the solvent combine to form solvent molecules[89]. For example, liquid ammonia is used as a solvent, and an ammonium salt such as NH4Cl is used as an acid because it provides a characteristic cationic NH 4 +; An amino compound, such as NaNH2, is a base because it provides a characteristic anionic NH 2 -. In 1923, Danish chemist Brnsted and British chemist Lowry put forward the acid-base proton theory, which extended the concept of acid-base to all proton systems: any substance that can give a proton (H+) is an acid; Any substance that can accept a proton is a base. For example, when HCl is dissolved in water, the H2O accepts a proton to form a H3O+, so the HCl that gives a proton is an acid and the H2O that accepts a proton is a base[89]. In 1923, Lewis, an American chemist, proposed the acid-base electron theory (also known as Lewis acid-base theory), which made the concept of acid-base get rid of the limitations of H+ and solvents: acid is the acceptor of electrons (commonly known as Lewis acid).A base is an electron donor (commonly known as a Lewis base), and an acid-base reaction is a process in which an acid accepts a pair of electrons from a base to form a coordination bond to give an acid-base adduct[89]. Taking HCl as an example, in the acid-base proton theory, HCl is a proton acid, and in the acid-base electron theory, HCl is an acid-base adduct formed by combining the Lewis acid H+ with the Lewis base Cl-. In 1963, American chemist Pearson further developed the Hard-soft-acid-base (HSAB) theory from the acid-base electron theory, and put forward the concept of "absolute hardness" η, which further divided acid (or base) into soft and Hard acids (or bases)[90]. The "absolute hardness" values of some acids and bases are shown in Tables 1 and 2. Generally speaking, the central atom with small volume, high positive charge and low polarizability is called hard acid, otherwise it is called soft acid, the coordinating atom with high electronegativity, low polarizability and difficult oxidation is called hard base, otherwise it is called soft base, and the other acids and bases are called critical acids and bases. Common hard and soft acids and bases and critical acids and bases are shown in Table 3.
表1 部分路易斯碱的绝对硬度[89]

Table 1 Absolute hardness of some Lewis bases[89]

Base Absolute hardness ( η B b) Base Absolute hardness ( η B b)
F- 7.0 CN- 5.3
Cl- 4.7 SH- 4.1
Br- 4.2 ClO- 4.5
I- 3.7 CO- 6.0
NH 2 - 5.3 H2O 7.0
OH- 5.6 H2S 5.3
NO- 4.5 NH3 6.9
表2 部分路易斯酸的绝对硬度[89]

Table 2 Absolute hardness of some Lewis acids[89]

Acid Absolute hardness ( η A b) Acid Absolute hardness ( η B b)
H+ Zn2+ 10.8
Li+ 35.1 Hg2+ 7.7
Na+ 21.1 Pb2+ 8.5
Rb+ 11.7 Ba2+ 12.8
Cu+ 6.3 Pd2+ 6.8
Ag+ 6.9 Cd2+ 10.3
Au+ 5.7 Al3+ 45.8
Mg2+ 32.5 Sc3+ 24.6
Ca2+ 19.7 Fe3+ 13.1
Ti2+ 7.0 La3+ 15.4
Mn2+ 9.3 I2 3.4
Fe2+ 7.3 Cl2 4.5
Ni2+ 8.5 CO2 6.9
Cu2+ 8.3 SO2 5.6
表3 常见的软硬酸碱[130]

Table 3 Typical soft and hard acids and bases[130]

Type Ions
Soft acid Pd2+, Pt2+, Pt4+, Cu+, Ag+, Cd2+, Hg2+, Br2, I2
Borderline acid Fe2+, Co2+, Ni2+, Cu2+, Zn2+, Ru3+, Sn2+, Pb2+, Sb2+
Hard acid H+, Li+, Na+, K+, Mg2+, Sr2+, Sc3+, La3+, Ce4+, Zr4+
Soft base H-, C2H4, C6H6, CN-, SCN-, R3P
Borderline base C6H5NH2, C5H5N, NO 2 -, SO 3 2 -, Br-
Hard base NH3, N2H4, OH-, PO 3 3 -, CO 3 2 -, NO 3 -, PO 4 3 -, SO 4 2 -, ClO 4 -, F-
Pearson gave the general rule of hard and soft acid and base reaction, that is, hard acid reacts with hard base to form stable complexes, and soft acid reacts with soft base to form stable complexes. This theory can be used to predict the stability of metal complexes, and to design and prepare selective ion adsorption materials, which has important theoretical and practical significance. In the research and development of selective ion exchange materials, researchers can select the appropriate acid and base as ligands according to the soft and hard acid and base properties of the target ion.As a specific functional group, it is loaded on resin, chitosan, metal organic framework, covalent organic framework, mesoporous silica and other framework materials to prepare adsorption materials, and finally the selective removal of target ions is achieved by using the priority of soft and hard acid-base reactions[34,28][39~41][91~93][42~44][94~96][89]. For example, sulfur-containing functional groups (soft bases) can selectively remove Hg2+ (soft acids) (Fig. 4)[97~106]; Metal ions (hard acid) can selectively remove F-, $\mathrm{PO}_{4}^{-}$, As (V), etc. (Hard base); -NH- and orthophosphate (hard base) can selectively remove Pb2+ in the presence of soft acid such As Hg2+ (critical acid), etc[107~116][117~121][122~125][126~129].
图5 含巯基冷冻凝胶吸附去除水中Hg2+[96]

Fig. 5 Removal of Hg2+ from water by sulfhydryl frozen gel[96]

3.2 Preparation of soft and hard acid and base materials and selective ion adsorption

According to the survey, soft and hard acid and base materials have been used in the selective adsorption of Hg2+, Pb2+, phosphate, F- and plasma. The following are some cases[131][126][117][107].
The sulfur-containing ligand (soft base) selectively adsorbs Hg2+ (soft acid). Ji et al. Prepared a Hg2+ selective adsorbent by loading thioglycolic acid onto a covalent organic framework (MOF), and systematically characterized the structural changes of the adsorbent before and after absorbing Hg2+ using FTIR and XPS spectra[132]. In Fig. 6a, the FTIR spectrum of the adsorbent shows that the -SH stretching vibration peak shifts from 2565cm-1 to 2426 cm-1 after the adsorption of Hg2+, which is caused by the complexation of Hg2+ with the -SH group on the adsorbent. In the wide scan XPS spectrum of Fig. 6 B, the characteristic peak of Hg 4F at 101.4 eV can be observed after the adsorption of Hg2+, indicating the successful adsorption of Hg2+. The new peaks at 100.6 eV (Hg 4F 7/2) and 104.6 eV (Hg 4F 5/2) in the Hg 4F XPS spectrum of Figure 6 C may also be attributed to the formation of -S-Hg complexes. Figure 6 d shows that the S 2p binding energy changes from 163.4 to 162.6 eV after the adsorption of Hg2+. The binding energy change of 0.8 eV indicates that a coordination bond with strong interaction between Hg2+ and the S atom of the adsorbent may be formed, and this strong interaction causes the high selectivity of this adsorbent for Hg2+ in a multi-ion mixture. Dias et al. Prepared TDD-organoclay by loading 1,3,4-thiadiazole-2,5-dithiol on the surface of HDTA-montmorillonite.In the presence of Hg2+, Cu2+, Pb2+,In the mixture of Cd2+, Ni2+ and Zn2+,The adsorption capacity of TDD-organoclay for Hg2+ was significantly stronger than that for other ions[131]. Pan et al. Prepared a novel macroporous chelating resin polymerized from epoxy resin and triethylenetetramine (TETA) and modified with carbon disulfide,It is found that in Cu2+, Pb2+, Cd2+, Ni2+,In the presence of Fe2+, Zn2+ and Mn2+, respectively,The adsorption of Hg2+ on the resin remained stable (about 98%), indicating that the resin had high Hg2+ selectivity[98]. Tzvetkova et al. Prepared a Hg2+ selective adsorbent by modifying silica gel with 5-amino-1,3,4-thiadiazole-2-thiol (S5A).In the presence of Hg2+, Cu2+, Co2+,In acidic solutions of Cd2+, Pb2+ and Ni2+,The selectivity of the adsorbent for Hg2+ is higher than that of other ions[133]. Jiang et al. Prepared a novel composite nanosphere with thiol-functionalized mesoporous SiO2 shell and Fe3O4-SiO2 core,In the presence of Cu2+, Pb2+, Cr2+, Ni2+, Zn2+The removal effect of Hg2+ is obvious (from 109.8 mg/L to 0.3 mg/L), while the content of other ions is almost unchanged[134]. The above selectivity mechanism can be explained by HSAB theory: the sulfur-containing ligand as a soft base has weak affinity for critical acids such as Cu2+ and Ni2+, and has strong affinity for soft acid Hg2+.
图6 Hg2+吸附前后的(a) FTIR, (b) XPS, (c) Hg 4f和(d) 吸附剂的S 2p光谱[132]

Fig. 6 (a) FTIR, (b) XPS, (c) Hg 4f and (d) S 2p spectra of adsorbent before and after Hg2+adsorption[132]

The hard base ligand selectively adsorbs Pb2+ (critical acid). Since the critical acid (Pb2+) is more "hard" than the soft acid, it is easier to combine with the hard base; It is more "soft" than hard acid and is easier to combine with soft base. Pan et al. Supported ZrP on chloromethylated polystyrene (CP) polymer in a mixture containing Pb2+, Na+, Ca2+ and Mg2+.The adsorption capacity of the adsorbent for Pb2+ (20 mg/G) is significantly higher than that of the common ion exchanger (0. 2 mg/G), and the removal capacity of Pb2+ remains stable with the increase of the concentration of coexisting ions[126]. Jia et al. Prepared a new hybrid adsorbent (TiP-001) by impregnating titanium phosphate (TiP) nanoparticles onto a strong acidic cation exchanger (D-001), and found that TiP-001 exhibited high Pb2+ selectivity compared with D-001 in the presence of Ca2+[128]. The above selectivity mechanism can be explained by HSAB theory that :Pb2+ is the critical acid, while Na (I), Ca2+ and Mg2+ are hard acids, so Pb2+ is easier to combine with soft base orthophosphate to form a stable complex. Liu et al. Copolymerized two polypyrromethanes loaded with hydroxyl functional groups (-OH), and found that the adsorption of Pb2+ by these two adsorption materials was not significantly affected in the presence of Cd2+ and Ni2+, respectively[129]. The selectivity mechanism of the material can be explained by the HSAB theory that :Pb2+ is a critical acid, Cd2+ and Ni2+ are soft acids,The hydroxyl group (-OH) is a hard base, so the affinity of Pb2+ to hydroxyl group (-OH) is greater than that of Cd2+ and Ni2+.
Metal ions (hard acids) selectively adsorb anions (hard bases). Common anions in water are usually hard bases, which are easy to react with hard acids (such as metal ions) to form stable complexes, and become one of the main research directions of specific anion selective adsorption materials in water. Wu et al. Supported La3+ on a polymeric ligand exchanger chelex-100 to selectively remove phosphate from water[117]. In the presence of Cl- and SO 4 2 -, the adsorption capacity of the adsorbent for phosphate remained stable (0.098 mmol·g-1 without Cl- and SO 4 2 -; 0.092 mmol·g-1 in the presence of Cl-, SO 4 2 -). Barsbay et al. Prepared a novel polymeric ligand exchanger (PLE) loaded with Cu2+ to selectively remove phosphate from water[118]. It was found that the adsorption of phosphate was significantly higher than that of other ions in low concentration solutions (1 mg/L phosphate, 1 mg/L bromide, 1 mg/Lnitrite, 10 mg/L sulfate and 10 mg/Lnitrate). Viswanathan et al. Prepared a novel adsorbent (Fe-CCB) to selectively remove fluoride from water by loading Fe3+ onto carboxylated chitosan beads[107]. It was found that in the presence of Cl-, SO 4 2 -, HCO 3 - and NO 3 -, the removal capacity of the adsorbent for F- only decreased from 4000 mg/kg to ~ 3500 mg/kg, enabling the selective removal of fluoride. Viswanathan et al. Prepared a new adsorbent by loading La3+ onto carboxylated chitosan beads, and found that in the presence of Cl-, SO 4 2 -, HCO 3 - and NO 3 -,The adsorbent showed a small decrease in the removal capacity of F- (from 4500 mg/kg to ~ 3500 mg/kg), enabling the selective removal of fluoride[108]. Vatutsina et al. Impregnated hydrated iron oxide (HFO) onto a fiber polymer ion exchanger, and the adsorption capacity of the adsorbent for As (Ⅲ) and As (V) did not decrease in the presence of Cl- and SO 4 2 -[135]. When phosphate is present, only the adsorption of As (V) is affected. Nilchi et al. Supported nanoscale sol-gel derived TiO2-SiO2 on porous polyacrylonitrile (PAN) polymer,In the presence of Cl-, NO 3 -, NO 2 -, SO 4 2 -, and SO 3 2 - anions,The distribution coefficient of the adsorbent for As (Ⅲ) is greater than 4000, and the distribution adsorption for As (Ⅴ) is greater than 5000, which indicates that the adsorbent can selectively remove As (Ⅲ) and As (Ⅴ) from water[136].
The acid-base theory has also been applied to the selective removal of radionuclides. Researchers have found that the amidoxime chelating group has a specific strong affinity for UO 2 2 +, and have developed a variety of adsorbents for the nuclear industry, such as the extraction of uranium from nuclear wastewater and the extraction of uranium from seawater. Sun et al. Prepared an amidoxime-functionalized covalent organic framework material (COF-TpDb-AO) to selectively adsorb UO 2 2 + in water, and the adsorbent material maintained high affinity and efficient removal capacity for UO 2 2 + ( UO 2 2 + content decreased from 1000 ppb to about 0.1 ppb in 30 min) in real water samples of drinking water, well water and river water[55]. Hao et al. Prepared a covalent organic framework material with electron donor-acceptor sites and amidoxime nanotraps for simultaneous selective adsorption and photocatalytic reduction of uranium to treat seawater. In spiked seawater at pH = 8.1 (the concentration of UO 2 2 + is ~ 2 to ~ 20 ppm), the adsorption material maintained a high adsorption capacity for UO 2 2 +, which is comparable to other high-performance uranium adsorbents[137]. Abney et al. Used density functional theory to study the principle of selective adsorption of UO 2 2 + by amidoxime group, and calculated the bond length and molecular orbital structure of [UO2(H2O)5]2+ and [UO2(AO)2(MeOH)2].It was found that the π-bonding orbital energy of the oxime ester functional group is higher than that of uranyl σ (d) and π (d), and that the π-conjugated orbital of O — N has a significant overlap with the 1πg and 2πu orbitals of UO 2 2 +, indicating a significant bonding interaction[138]. The Wiberg bond index (WBI) was calculated by natural bond orbital (NBO) analysis, and it was found that the strength of the amidoxime ester bond and the energy of the p orbital of the oxygen lone pair electron in the amidoxime ester group increased with the increase of the electron-donating ability of the substituent.O that the amidoxime has stronger interaction with the σ (f) orbital of uranium, so the amidoxime adsorbent containing the substituent with strong electron-donating ability has stronger binding ability with UO 2 2 +. Finally, based on this principle, two new oxime-functionalized imidazole adsorbents with greater uranyl ion affinity were developed.
Selective ion removal technology based on the theory of hard and soft acids and bases is one of the most widely used selective technologies, and the main application of this principle is to load specific acid and base ligands on the carrier material. At present, the selective research based on the HSAB theory focuses on the use of acid-base ligands and support materials, especially with the development of nanotechnology, the treatment effect and adsorption capacity of the selective materials developed have also been improved. However, there are relatively few studies on the theory of hard and soft acids and bases, and further studies can be made on the binding mechanism between ligands and target ions in the future.

4 Selective anion adsorption materials based on non-electrostatic interaction

In addition to electrostatic interaction, non-electrostatic interactions such as hydrophilicity/hydrophobicity and hydrogen bonding are also involved in the adsorption process of inorganic ions. By optimizing the type of active groups, the hydrophilicity/hydrophobicity and hydrogen bonding adsorption of some inorganic ions can be strengthened to achieve selective adsorption effect. This principle has been applied to the research and development of selective adsorption materials for anions such as $\mathrm{NO}_{3}^{-}$, $\mathrm{TcO}_{4}^{-}$ and $\mathrm{ClO}_{4}^{-}$[139141][142][143].

4.1 Hydrophilicity/hydrophobicity based selective ion adsorption

Hydration energy (hydration enthalpy) refers to the energy released when one mole of ions is hydrated. Generally speaking, the greater the hydration energy, the more hydrophilic the ions are, and the smaller the hydration energy, the more hydrophobic the ions are[144]. Table 4 shows the values of hydration energy for some common anions. Compared with the active group trimethylamine (i.e., -N(CH3)3) of the standard strong base anion resin, the active group with longer carbon chain means stronger hydrophobicity and is able to selectively adsorb more hydrophobic ions[8]. Therefore, the selective adsorption of strongly hydrophobic ions can be achieved by selecting active groups with longer carbon chains, and the smaller the hydration energy of anions is, the stronger the hydrophobicity is, and the easier it is to be adsorbed by adsorbents with long-chain structural groups. For example, Behnsen and Riebe modified bentonite with three long-chain groups, cetylpyridinium, cetyltrimethylammonium, and benzethonium,The order of affinity of the three adsorbents for the six anions was found to be ReO 4 -.>I-> NO 3 - >Br->Cl-> SO 4 2 - > SeO 3 2 - ,Corresponding to the order of increase in the combined energy of these anions[145].
表4 常见阴离子的水合能(Δh H I )[146]

Table 4 Hydration energy of typical anions[146]

Ion h H I / kJ·mol-1 Ion h H I / kJ·mol-1
F- 510 ClO 4 - 246
Cl- 367 BrO 3 - 376
Br- 336 I O 3 - 450
I- 291 ReO 4 - 244
CN- 346 HCO 3 - 384
SCN- 311 $\mathrm{H}_{2}\mathrm{PO}^{-}_{4}$ 522
NO 3 - 312 CO 3 2 - 1397
SO 4 2 - 1035 SeO 4 2 - 964
CrO 4 2 - 1261 PO 4 3 - 2879
Based on this principle, many studies have developed selective adsorption materials for strong hydrophobic anions (such as $\mathrm{NO}_{3}^{-}$, $\mathrm{TcO}_{4}^{-}$, $\mathrm{ClO}_{4}^{-}$, etc.)[139141][142][143]. For example, triethylamino polystyrene resin NDP-2 prepared by Song et al. Can selectively adsorb NO 3 - in the coexistence solution of Cl-, HCO 3 - and SO 4 2 -;Ethylenediamine-based polystyrene resin ADVEGR prepared by Sowmya et al. Preferentially adsorbs NO 3 - in the coexistence solution of NO 3 -, Cl-, HPO 4 2 - and SO 4 2 -[140][141]. On the other hand, too long carbon chain of active group will lead to the increase of crosslinking density and pore size of adsorbent, which will reduce the capacity and ion exchange efficiency of adsorbent[142]. Kang et al. Prepared quaternary aminated mesoporous silica adsorbents (C1Q- to C18Q-SBA-15) with active groups containing C numbers of 1, 4, 8, 12 and 18, respectively, and found that in the presence of HCO 3 -, Cl-, HPO 4 2 - and SO 4 2 -,C8Q- and C12Q-SBA-15 were more effective in removing NO 3 - than C1Q- and C4Q-SBA-15, while the adsorption capacity of C18Q-SBA15 for NO 3 - was less than that of the other four adsorbents[139].
Some researchers use both long-chain and short-chain active groups to achieve selective adsorption through long-chain active groups and to improve adsorption kinetics through short-chain active groups[142]. For example, Gu et al. Prepared trihexylamine and triethylamine bifunctional polystyrene resin, which selectively adsorbed more hydrophobic radioactive ion TcO 4 - under the coexistence of Cl-, NO 3 -, SO 4 2 - and HCO 3 -.When applied to underground treatment, the penetration volume exceeds 250 000 bed volume, the resin can selectively adsorb ClO 4 - with stronger hydrophobicity in the coexistence of NO 3 - and SO 4 2 -, and the penetration volume can reach 38 000 bed volume when treating groundwater with high concentration of ClO 4 -[142][143]. Through scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX) analysis of the material (Fig. 7), it was found that compared with the TcO 4 - selective adsorbent (Purolite A-520E) with only long-chain functional groups, the adsorbent with both long-chain and short-chain active groups had more pores and larger specific surface area, thus achieving TcO 4 - selective adsorption and higher ion exchange efficiency.
图7 (a) Purolite A-520E和(b) 双功能(RO-02-119)树脂珠的矿床和表面形态扫描电子显微图像[142]

Fig. 7 Scanning electron microscopic images showing the mineral deposits and surface morphology of (a) Purolite A-520E and (b) bifunctional (RO-02-119) resin beads[142]

The application of hydrophilic/hydrophobic-based selective ion adsorption technology is closely related to the hydration energy of the target ion, and only the ions with strong hydrophobicity can be treated by this technology, which limits the range of ions suitable for this technology. At present, only three ions, NO 3 -, TcO 4 - and ClO 4 -, have been studied as target ions. In the future, other target ions suitable for this mechanism can be found for selectivity related studies.

4.2 Selective ion adsorption based on hydrogen bonding

Molecules containing hydrogen bonding functional groups (such as hydroxyl, carbonyl, and nitrile) can selectively adsorb guest substances through hydrogen bonding between the more electronegative atom X and a hydrogen atom that is already covalently bonded to the more electronegative atom Y (X-H … Y), such as two O atoms or an O atom and an N atom[147][148][149]. Adsorption materials prepared according to this principle have been used for selective adsorption of $\mathrm{H}_{2}\mathrm{PO}_{4}^{-}$, $\mathrm{HAsO}_{4}^{2-}$, etc. For example, Yu et Al prepared organic-inorganic composite adsorption materials by intercalating pyromellitic acid (PMA) into Zn-Al layered double hydroxide.In $\mathrm{H}_{2}\mathrm{PO}^{-}_{4}$, SO 4 2 -, CO 3 2 -,The high-selectivity adsorption of the $\mathrm{H}_{2}\mathrm{PO}_{4}^{-}$ is realized under the coexistence condition of the NO 3 - and the Cl-,XPS spectrum analysis before and after $\mathrm{H}_{2}\mathrm{PO}_{4}^{-}$ adsorption found that (Fig. 8A),The electron density of the carbon atom in the carboxyl group (— COOH) decreases, which may be due to the electron transfer under the formation of hydrogen bonds, resulting in the decrease of the electron density in C = O[149][51][149]. Then the electron density in C with C = O adjacent to O increases. Compared with the non-PMA-modified layered double hydroxide, the P 2p electron density in the $\mathrm{H}_{2}\mathrm{PO}_{4}^{-}$ adsorbed by the selective material decreased (Fig. 8 B), which may be due to the formation of hydrogen bonds to increase the electron density of — OH and decrease the electron density in the adjacent P. XPS analysis shows that the hydrogen bonding occurs between the oxygen dissociated from the carboxyl group (-COOH) in PMA and the hydroxyl group (-OH) of phosphate. Huang et al. Prepared triethylenetetramine activated lignin, and realized the highly selective adsorption of As (Ⅴ) under the coexistence of Cr (Ⅵ), P (Ⅴ) and As (Ⅴ), and the hydrogen bonding occurred between the N atom of triethylenetetramine and the hydroxyl group of HAsO 4 2 -[51]. Liang et al. Prepared microporous carbon materials (MCM) and achieved highly selective adsorption of phosphate under the coexistence of SO 4 2 -, CO 3 2 - and Cl-, and the hydrogen bonding occurred between the carboxyl group of MCM and the hydroxyl group of phosphate[150].
图8 (a)吸附前后Zn2Al PMA LDHs之间XPS C 1s峰的演变,以及(b)吸附后Zn2Al-PMA LDHs和Zn2Al Cl LDHs的XPS P 2p峰的比较[149]

Fig. 8 (a) Evolution of the XPS C 1s peaks between Zn2Al-PMA-LDHs before and after adsorption and (b) comparison of the XPS P 2p peaks between Zn2Al-PMA-LDHs and Zn2Al-Cl-LDHs after adsorption[149]

In general, compared with other selective techniques, the selective ion removal technique based on hydrogen bonding has a unique effect on the selective adsorption of oxygen anions with hydroxyl or carboxyl groups, and is an effective method for the selective removal of some oxygen anions. In the future, further research can be done on the development of adsorption materials and the improvement of their stability and adsorption capacity.

5 Selective ion adsorption by standard resin based on competitive ion self-inhibition mechanism

Recent studies have shown that the adsorption of competitive ions on standard resin can be effectively inhibited by optimizing the electron equivalence ratio of competitive ions and counter ions in the regeneration solution and using it to activate or regenerate the standard resin.However, it does not affect the adsorption of target ions, and realizes the selective adsorption of target ions in water by standard resin. At present, this principle has been successfully applied to the removal of $\mathrm{NO}_{3}^{-}$ and trace As (V) in groundwater[8]. For example, Duan et al. Activated/regenerated the standard anion resin column based on different SO 4 2 - of the regenerated solution or the ion removal effect after the circulation of the electron equivalence ratio of HCO 3 - (I.Stable and highly selective removal (> 80%) of 200 mg/L NO 3 - from groundwater by standard anion resin column in 13 adsorption-regeneration cycles was achieved by using a critical equivalence ratio regeneration solution with SO 4 2 - or HCO 3 - removal rate of < 5%[8]. Li et al. Optimized the electron equivalence ratio of SO 4 2 - (i.e., competitive ion) :Cl- or HCO 3 - (i.e., counter ion) in the regeneration solution, and after cyclic activation/regeneration of the standard anion resin column, the stable and highly selective removal (> 80%) of 110μg/L arsenate ion in groundwater was achieved in 18 adsorption-regeneration cycles, and the removal rate of SO 4 2 - was less than 5%[151].
The selectivity mechanism of competitive ion self-inhibition is a new selectivity mechanism. Compared with other selective ion adsorption technologies, the standard resin selective ion adsorption technology does not require the preparation of new adsorption materials, and can achieve the selective removal of target ions only with commercially available standard materials, and has the potential of using the same adsorption material to selectively adsorb different target ions, which has important theoretical and application values. From the current research, it can be seen that the self-inhibition mechanism of competitive ions is not perfect and lacks certain data support, and further research can be carried out on the explanation of the self-inhibition mechanism of competitive ions and related influencing factors in the future.

6 Conclusion and prospect

Among the four selective ion adsorption principles, molecular imprinting technology and soft and hard acid and base theory have been applied to the research and development of selective ion adsorption materials for a long time, and they are also the most successful and widely used selective ion adsorption principles. Relatively speaking, adsorption materials based on non-electrostatic interaction principle are only used for selective adsorption of some inorganic anions at present, and the number of studies is limited, while the self-inhibition principle of competitive ions is a newly discovered chemical principle in recent years.This mechanism does not form a new selective ion adsorption material, and the selective ion adsorption effect is obtained only by relying on the standard resin, which is significantly different from the other three mechanisms, and has the potential to achieve the selective adsorption removal of different target ions by using the same conventional material.
Compared with the huge number of research papers, the new selective ion adsorption materials that can be purchased through market channels are extremely rare, and the research and development of a large number of excellent selective ion adsorption materials only stay at the level of papers, which has become the main bottleneck for the application of excellent selective ion absorption materials in production practice. In this case, it is undoubtedly more feasible to abandon the new research and development ideas of selective ion adsorption materials and use mature commercial materials as carriers to obtain new selective ion adsorption materials through simple loading or modification. In addition, the current research mainly focuses on the selective adsorption of harmful ions from water to the solid surface, when the adsorption material is saturated, it will lose its adsorption capacity and produce a large number of hazardous wastes.The research and development of downstream technologies, such as the retreatment of saturated adsorption materials and the reuse of adsorption materials and even regenerated liquid, are helpful to reduce the production of secondary waste, which is of great environmental significance.
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